Transmission Electron Microscopy in Micro-nanoelectronics
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Transmission Electron Microscopy in Micro-nanoelectronics

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eBook - ePub

Transmission Electron Microscopy in Micro-nanoelectronics

Book details
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About This Book

Today, the availability of bright and highly coherent electron sources and sensitive detectors has radically changed the type and quality of the information which can be obtained by transmission electron microscopy (TEM). TEMs are now present in large numbers not only in academia, but also in industrial research centers and fabs.
This book presents in a simple and practical way the new quantitative techniques based on TEM which have recently been invented or developed to address most of the main challenging issues scientists and process engineers have to face to develop or optimize semiconductor layers and devices. Several of these techniques are based on electron holography; others take advantage of the possibility of focusing intense beams within nanoprobes. Strain measurements and mappings, dopant activation and segregation, interfacial reactions at the nanoscale, defect identification and specimen preparation by FIB are among the topics presented in this book. After a brief presentation of the underlying theory, each technique is illustrated through examples from the lab or fab.

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Yes, you can access Transmission Electron Microscopy in Micro-nanoelectronics by Alain Claverie in PDF and/or ePUB format, as well as other popular books in Technology & Engineering & Microelectronics. We have over one million books available in our catalogue for you to explore.

Information

Publisher
Wiley-ISTE
Year
2013
ISBN
9781118579053
Edition
1
Topic
Technology & Engineering
Subtopic
Microelectronics
Index
Technology & Engineering

Table of contents

  1. Cover
  2. Contents
  3. Title page
  4. Copyright page
  5. Introduction
  6. Chapter 1: Active Dopant Profiling in the TEM by Off-Axis Electron Holography
  7. Chapter 2: Dopant Distribution Quantitative Analysis Using STEM-EELS/EDX Spectroscopy Techniques
  8. Chapter 3: Quantitative Strain Measurement in Advanced Devices: A Comparison Between Convergent Beam Electron Diffraction and Nanobeam Diffraction
  9. Chapter 4: Dark-Field Electron Holography for Strain Mapping
  10. Chapter 5: Magnetic Mapping Using Electron Holography
  11. Chapter 6: Interdiffusion and Chemical Reaction at Interfaces by TEM/EELS
  12. Chapter 7: Characterization of Process-Induced Defects
  13. Chapter 8: In Situ Characterization Methods in Transmission Electron Microscopy
  14. Chapter 9: Specimen Preparation for Semiconductor Analysis
  15. List of Authors
  16. Index