
- 318 pages
- English
- ePUB (mobile friendly)
- Available on iOS & Android
FinFET Devices for VLSI Circuits and Systems
About this book
To surmount the continuous scaling challenges of MOSFET devices, FinFETs have emerged as the real alternative for use as the next generation device for IC fabrication technology. The objective of this book is to provide the basic theory and operating principles of FinFET devices and technology, an overview of FinFET device architecture and manufacturing processes, and detailed formulation of FinFET electrostatic and dynamic device characteristics for IC design and manufacturing. Thus, this book caters to practicing engineers transitioning to FinFET technology and prepares the next generation of device engineers and academic experts on mainstream device technology at the nanometer-nodes.
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Information
Table of contents
- Cover
- Half-Title
- Title
- Copyright
- Dedication
- Contents
- Preface
- Author
- Chapter 1 Introduction
- Chapter 2 Fundamentals of Semiconductor Physics
- Chapter 3 Multiple-Gate Metal-Oxide-Semiconductor (MOS) System
- Chapter 4 Overview of FinFET Device Technology
- Chapter 5 Large Geometry FinFET Device Operation
- Chapter 6 Small Geometry FinFETs: Physical Effects on Device Performance
- Chapter 7 Leakage Currents in FinFETs
- Chapter 8 Parasitic Elements in FinFETs
- Chapter 9 Challenges to FinFET Process and Device Technology
- Chapter 10 FinFET Compact Models for Circuit Simulation
- Index
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