High-k Materials in Multi-Gate FET Devices

Shubham Tayal, Parveen Singla, J. Paulo Davim, Shubham Tayal, Parveen Singla, J. Paulo Davim

• Publisher: CRC Press
• Year: 2021
• Print ISBN: 9780367639686
• eBook ISBN: 9781000438819
• Topic: Technology & Engineering
• Subtopic: Condensed Matter
• Index: Technology & Engineering

High-k Materials in Multi-Gate FET Devices focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. It covers the various way of utilizing high-k dielectrics in multi-gate FETs for enhancing their performance at the device as well as circuit level.

• Provides basic knowledge about FET devices
• Presents the motivation behind multi-gate FETs, including current and future trends in transistor technologies
• Discusses fabrication and characterization of high-k materials
• Contains a comprehensive analysis of the impact of high-k dielectrics utilized in the gate-oxide and the gate-sidewall spacers on the GIDL of emerging multi-gate FET architectures
• Offers detailed application of high-k materials for advanced FET devices
• Considers future research directions

This book is of value to researchers in materials science, electronics engineering, semiconductor device modeling, IT, and related disciplines studying nanodevices such as FinFET and Tunnel FET and device-circuit codesign issues.

Table of contents

• Cover
• Half Title
• Series Page
• Title Page
• Copyright Page
• Contents
• Preface
• Editors
• Contributors
• 1 Introduction to Multi-Gate FET Devices
• 2 High-k Gate Dielectrics and Metal Gate Stack Technology for Advance Semiconductor Devices: An overview
• 3 Influence of High-k Material in Gate Engineering and in Multi-Gate Field Effect Transistor Devices
• 4 Trap Charges in High-k and Stacked Dielectric
• 5 Impact of High-k Dielectric on the Gate-Induced Drain Leakage of Multi-Gate FETs
• 6 Advanced FET Design Using High-k Gate Dielectric and Characterization for Low-Power VLSI
• 7 Simulation and Analysis of Gate Stack DG MOSFET with Application of High-k Dielectric Using Visual TCAD
• 8 Novel Architecture in Gate-All-Around (GAA) MOSFET with High-k Dielectric for Biomolecule Detection
• 9 Asymmetric Junctionless Transistor: A SRAM Performance Study
• 10 Performability Analysis of High-k Dielectric–Based Advanced MOSFET in Lower Technology Nodes
• Index